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Align glyphs in a LayoutRun to baseline

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Héctor Ramón Jiménez 2023-06-16 01:47:35 +02:00
parent 3640b5e1ef
commit c2bef6a345
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GPG key ID: 140CC052C94F138E
3 changed files with 37 additions and 11 deletions
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20
src/buffer.rs
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@ -119,9 +119,9 @@ pub struct LayoutRun<'a> {
pub rtl: bool,
/// The array of layout glyphs to draw
pub glyphs: &'a [LayoutGlyph],
/// Y offset of line
/// Y offset to baseline of line
pub line_y: f32,
/// width of line
/// Width of line
pub line_w: f32,
}
@ -187,7 +187,6 @@ pub struct LayoutRunIter<'b> {
line_i: usize,
layout_i: usize,
remaining_len: usize,
line_y: f32,
total_layout: i32,
}
@ -222,7 +221,6 @@ impl<'b> LayoutRunIter<'b> {
line_i: 0,
layout_i: 0,
remaining_len: bottom_cropped_layout_lines,
line_y: buffer.metrics.y_offset(),
total_layout: 0,
}
}
@ -248,11 +246,15 @@ impl<'b> Iterator for LayoutRunIter<'b> {
continue;
}
self.line_y += self.buffer.metrics.line_height;
if self.line_y - self.buffer.metrics.y_offset() > self.buffer.height {
let line_y = self.line_i as f32 * self.buffer.metrics.line_height;
if line_y > self.buffer.height {
return None;
}
let glyph_height = layout_line.max_ascent + layout_line.max_descent;
let centering_offset = (self.buffer.metrics.line_height - glyph_height) / 2.0;
return self.remaining_len.checked_sub(1).map(|num| {
self.remaining_len = num;
LayoutRun {
@ -260,7 +262,7 @@ impl<'b> Iterator for LayoutRunIter<'b> {
text: line.text(),
rtl: shape.rtl,
glyphs: &layout_line.glyphs,
line_y: self.line_y,
line_y: line_y + centering_offset + layout_line.max_ascent,
line_w: layout_line.w,
}
});
@ -298,10 +300,6 @@ impl Metrics {
line_height: self.line_height * scale,
}
}
fn y_offset(&self) -> f32 {
self.font_size - self.line_height
}
}
impl fmt::Display for Metrics {